Structural and Electrochemical Characterization of Nanostructured Titanium Thin Films Prepared by DC Magnetron Sputtering with Supported Discharge

In this study, nanostructured titanium (Ti) thin films were prepared by direct current magnetron sputtering (diode mode) and supported discharge (triode mode) on a stainless steel substrate. The X-ray diffraction pattern shows a preferred orientation (002) plane and exhibits a hexagonal cubic structure for the film prepared at a lower working pressure (0.7 Pa). The electrical resistivity was found to be 15 µΩ-cm. The scanning electron microscopy analysis indicates that the coatings in triode mode have agglomerates with larger grains compared to the DC magnetron sputtering diode mode. The surface topography was examined by atomic force microscopy. The electrochemical studies of the Ti thin films coated at a lower working pressure (0.7 Pa) provide evidence for better corrosion resistance.