A preliminary study on chemical micro-machining of complex three-dimensional patterns on silicon substrates

被引：0
|
作者：
Kang Shi
Jing Tang
Li Zhang
Yong-liang Zhou
Dong-sheng Qu
Li-Ning Sun
Zhong-Qun Tian
机构：
[1] Xiamen University,State Key Laboratory for Physical Chemistry of Solid Surfaces and Department of Chemistry
[2] Harbin Institute of Technology,The Institute of Robots
来源：
Journal of Solid State Electrochemistry | 2005年 / 9卷
关键词：
Micro-machining; Confined etchant layer technique; Cysteine; Silicon; Etching;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Chemical micro-machining of complex 3-dimensional (3-D) patterns of silicon substrates was preliminarily explored by the confined etchant layer technique (CELT). Through systematic investigation, we demonstrated that cysteine as a scavenger and Br2 as an etchant can be used to etch silicon substrates. The CELT has the potential to develop into a new means of micro-machining complex 3-D patterns on silicon substrates. However, due to the highly corrosive property of the chemicals used for the silicon etched system, great effort must be made to overcome these problems including the mold electrode with high chemical stability.
引用
收藏
页码：398 / 402
页数：4
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