Technological ion sources based on a vacuum arc discharge

被引：1
|
作者：
Bugaev S.P. [1 ]
Nikolaev A.G. [1 ]
Oks E.M. [1 ]
Yushkov G.Y. [1 ]
Schanin P.M. [1 ]
Brown Y. [2 ]
机构：
[1] Institute of High Current Electronics, Siberian Branch, Russian Academy of Sciences
[2] Lawrence Livermore National Laboratory, Berkeley CA
来源：
Russian Physics Journal | 2001年 / 44卷 / 9期
关键词：
Titan; High Current; Discharge System; Current Electronics; Component Ratio;
D O I：
10.1023/A:1014301704666
中图分类号：
学科分类号：
摘要：
Technological ion sources of the TITAN type have been developed at the Institute of High Current Electronics, RAS, for the last ten years. These sources generate wide-aperture high-current beams of gas or metal ions and also mixed two-component gas-metal ion beams with a controllable component ratio. This is possible due to two discharge systems combined into one discharge system of the source. Metal ions are obtained with a vacuum arc discharge and gas ions are generated with a constricted hollow-cathode low-pressure arc discharge. This paper describes the principle and peculiarities of operation of the given sources, their design, parameters, and fields of application. A modified version of the Mevva ion source is considered. The design of this version is based on the results of studies conducted using the TITAN source. ©2001 Plenum Publishing Corporation.
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收藏
页码：921 / 926
页数：5
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