Technological vacuum-arc sources of plasma for electronic industry

被引：0
|
作者：
Lisenkov, AA [1 ]
Merva, NV [1 ]
机构：
[1] Russian Acad Sci, Inst Mech Sci Problems, St Petersburg 196140, Russia
来源：
APEIE-98: 1998 4TH INTERNATIONAL CONFERENCE ON ACTUAL PROBLEMS OF ELECTRONIC INSTRUMENT ENGINEERING PROCEEDINGS, VOL 1 | 1998年
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The physical features and main forming laws of various geometry plasma streams, generated by technological vacuum-are sources of plasma are represented.
引用
收藏
页码：57 / 58
页数：2
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