Laser deposition of gallium nitride films

被引：0
|
作者：
I. V. Grekhov
I. A. Liniĭchuk
I. E. Titkov
机构：
[1] Russian Academy of Sciences,Ioffe Physicotechnical Institute
来源：
Technical Physics Letters | 2006年 / 32卷
关键词：
42.62.-b;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Insulating c-oriented hexagonal epitaxial gallium nitride (GaN) films have been obtained by means of pulsed laser sputtering of a gallium target in nonactivated nitrogen atmosphere. The GaN films were deposited onto (0001)-oriented sapphire substrates either directly or above a ZnO buffer layer. The laser-deposited films exhibit edge photoluminescence at 370 nm.
引用
下载
收藏
页码：197 / 198
页数：1
相关论文
共 50 条
  • [41] Cobalt nitride films produced by reactive pulsed laser deposition
    De la Cruz, W.
    Contreras, O.
    Soto, G.
    Perez-Tijerina, E.
    REVISTA MEXICANA DE FISICA, 2006, 52 (05) : 409 - 412
  • [42] Optical studies on the deposition of carbon nitride films by laser ablation
    Ren, ZM
    Wang, PN
    Du, YC
    Ying, ZF
    Li, FM
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1997, 65 (4-5): : 407 - 409
  • [43] Pulsed laser deposition and modification of cubic boron nitride films
    Weissmantel, S.
    Reisse, G.
    Keiper, B.
    Weber, A.
    Falke, U.
    Roeder, M.
    Applied Surface Science, 1998, 127-129 : 444 - 450
  • [44] Pulsed laser deposition and modification of cubic boron nitride films
    Weissmantel, S
    Reisse, G
    Keiper, B
    Weber, A
    Falke, U
    Roder, M
    APPLIED SURFACE SCIENCE, 1998, 127 : 444 - 450
  • [45] Pulsed laser deposition of hexagonal and cubic boron nitride films
    Reisse, G
    Weissmantel, S
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1999, 69 (Suppl 1): : S749 - S753
  • [46] Infrared Pulsed Laser Deposition of Niobium Nitride Thin Films
    Chaudhuri, S.
    Nevala, M. R.
    Hakkarainen, T.
    Niemi, T.
    Maasilta, I. J.
    IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY, 2011, 21 (03) : 143 - 146
  • [47] Pulsed laser deposition of thin refractory metal nitride films
    Fernández, M
    Bereznai, M
    Caricato, AP
    D'Anna, A
    Juhász, A
    Leggieri, G
    Luches, A
    Majni, G
    Martino, M
    Mengucci, P
    Nagy, PM
    Nánai, L
    Tóth, Z
    ALT'02 INTERNATIONAL CONFERENCE ON ADVANCED LASER TECHNOLOGIES, 2003, 5147 : 343 - 352
  • [48] Advances in Pulsed Laser Deposition growth of nitride thin films
    Fernández, FE
    Pumarol, M
    Martínez, A
    Jia, WY
    Wang, YY
    Rodríguez, E
    Mourad, HA
    LASER APPLICATIONS IN MICROELECTRONIC AND OPTOELECTRONIC MANUFACTURING IV, 1999, 3618 : 475 - 486
  • [49] Deposition and characterization of carbon nitride films by laser processed methods
    Kumar, A
    Alexandrescu, R
    George, MA
    ADVANCES IN LASER ABLATION OF MATERIALS, 1998, 526 : 367 - 372
  • [50] Characteristics of titanium nitride films grown by pulsed laser deposition
    Chowdhury, R
    Vispute, RD
    Jagannadham, K
    Narayan, J
    JOURNAL OF MATERIALS RESEARCH, 1996, 11 (06) : 1458 - 1469
12345