Pulsed arc deposition of super-hard amorphous carbon films

被引：0
|
作者：
H. Schulz
H.-J. Scheibe
P. Siemroth
B. Schultrich
机构：
[1] Fraunhofer Institut für Werkstoff- und Strahltechnik Dresden,
来源：
Applied Physics A | 2004年 / 78卷
关键词：
Amorphous Carbon; Deposition Condition; Carbon Film; Film Property; Amorphous Carbon Film;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Hydrogen-free amorphous carbon films with hardness up to 75 GPa have been deposited by special pulsed arc techniques. The influence of plasma and deposition conditions on the film properties is discussed and some applications are shown.
引用
收藏
页码：675 / 679
页数：4
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