Properties of a low-pressure inductive RF discharge I: Experiment

被引:0
|
作者
A. F. Aleksandrov
K. V. Vavilin
E. A. Kral’kina
V. B. Pavlov
A. A. Rukhadze
机构
[1] Moscow State University,Prokhorov Institute of General Physics
[2] Russian Academy of Sciences,undefined
来源
Plasma Physics Reports | 2007年 / 33卷
关键词
52.80.Pi;
D O I
暂无
中图分类号
学科分类号
摘要
Results are presented from experimental studies of low-pressure inductive RF discharges (including those with a capacitive component) employed in plasma technology. It is shown that both the RF power absorbed in the plasma and the electron density depend nonmonotonically on the external magnetic field. Discharge disruptions occurring at critical values of the magnetic field and the spatial redistribution and hysteresis of the plasma parameters were observed when varying the magnetic field and RF generator power. The parameters of the plasma of low-pressure (0.5–5 mTorr) inductive RF discharges were investigated, and the discharge properties related to the redistribution of the RF generator power between the plasma and the discharge external circuit were revealed. The experiments were performed with both conventional unmagnetized inductive plasma sources and plasma sources with a magnetic field.
引用
收藏
页码:733 / 745
页数:12
相关论文
共 50 条
  • [21] Modes of rf capacitive discharge in low-pressure sulfur hexafluoride
    Lisovskiy, V.
    Booth, J-P
    Jolly, J.
    Martins, S.
    Landry, K.
    Douai, D.
    Cassagne, V.
    Yegorenkov, V.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2007, 40 (22) : 6989 - 6999
  • [22] MULTIPACTING ELECTRON ENERGIES ASSOCIATED WITH A LOW-PRESSURE RF DISCHARGE
    LITTLEFIELD, RG
    HARMON, GS
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1979, 24 (05): : 760 - 760
  • [23] ANOMALOUS SHEATH HEATING IN A LOW-PRESSURE RF DISCHARGE IN NITROGEN
    TURNER, MM
    HOPKINS, MB
    PHYSICAL REVIEW LETTERS, 1992, 69 (24) : 3511 - 3514
  • [24] LOW-PRESSURE RF DISCHARGE IN THE FREE-FLIGHT REGIME
    KAGANOVICH, ID
    TSENDIN, LD
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 1992, 20 (02) : 86 - 92
  • [25] LOW-PRESSURE RF DISCHARGE IN ELECTRONEGATIVE GASES FOR PLASMA PROCESSING
    FEOKTISTOV, VA
    LOPAEV, DV
    KLOPOVSKY, KS
    POPOV, AM
    POPOVICHEVA, OB
    RAKHIMOV, AT
    RAKHIMOVA, TV
    JOURNAL OF NUCLEAR MATERIALS, 1993, 200 (03) : 309 - 314
  • [26] Behavior of the space potential of a low-pressure rf discharge plasma
    Lisovskii, V. A.
    Krasnikov, O. V.
    Technical Physics Letters, 21 (11):
  • [27] FERROMAGNETIC-ENHANCED LOW-PRESSURE INDUCTIVE DISCHARGE FOR PLASMA PROCESSING
    Isupov, M. V.
    Pinaev, V. A.
    JOURNAL OF APPLIED MECHANICS AND TECHNICAL PHYSICS, 2023, 64 (05) : 757 - 766
  • [28] MAGNETIC-FIELD DISTRIBUTION MEASUREMENTS IN A LOW-PRESSURE INDUCTIVE DISCHARGE
    PIEJAK, R
    GODYAK, V
    ALEXANDROVICH, B
    JOURNAL OF APPLIED PHYSICS, 1995, 78 (09) : 5296 - 5301
  • [29] Low-pressure inductive discharges
    Kolev, St
    Paunska, Ts
    Shivarova, A.
    Tarnev, Kh
    SECOND INTERNATIONAL WORKSHOP AND SUMMER SCHOOL ON PLASMA PHYSICS, 2007, 63
  • [30] FERROMAGNETIC-ENHANCED LOW-PRESSURE INDUCTIVE DISCHARGE FOR PLASMA PROCESSING
    M. V. Isupov
    V. A. Pinaev
    Journal of Applied Mechanics and Technical Physics, 2023, 64 : 757 - 766