Field-effect transistor based on ZnO:Li films

被引:0
|
作者
R. B. Hovsepyan
N. R. Aghamalyan
S. I. Petrosyan
机构
[1] NAS of Armenia,Institute of Physical Research
关键词
ZnO:Li film; field-effect transistor; photoelectric characteristics;
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学科分类号
摘要
Field-effect transistors with n- and p-types of the channel on the base of ZnO:Li oxide films and MgF2 fluoride film as a gate insulator were prepared. The field effect as well as the UV radiation influence on the field effect in ZnO:Li thin films were investigated. Photoelectric characteristics of the obtained thin-film field-effect transistors were studied. A mechanism of photoelectric amplification in the obtained transistors is proposed.
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页码:262 / 268
页数:6
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