Effects of moisture barriers on resistive switching in Pt-dispersed SiO2 nanometallic thin films

被引:0
|
作者
Byung Joon Choi
I-Wei Chen
机构
[1] University of Pennsylvania,Department of Materials Science and Engineering
来源
Applied Physics A | 2013年 / 112卷
关键词
Atomic Layer Deposition; Resistive Switching; Water Vapor Transmission Rate; Al2O3 Layer; Resistive Switching Memory;
D O I
暂无
中图分类号
学科分类号
摘要
Moisture invasion into memory devices can result in data loss and malfunctions in write/erase switching. Deteriorated uniformity and retention characteristics, and distorted switching hysteresis loops, are observed in moisture-attacked Pt-dispersed SiO2 nanometallic thin-film devices, and can be effectively prevented by coating the device with a nanoscale Al2O3 barrier layer grown by an atomic layer deposition method. The moisture-attacked devices exhibit evidence of cumulating ion current and ion potential with repeated switching. In contrast, a capped device with an extremely uniform and reproducible resistive switching behavior features a completely symmetric current–voltage curve expected for a purely electronic device.
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页码:235 / 239
页数:4
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