Synaptic behaviors and modeling of a metal oxide memristive device

被引:0
|
作者
Ting Chang
Sung-Hyun Jo
Kuk-Hwan Kim
Patrick Sheridan
Siddharth Gaba
Wei Lu
机构
[1] University of Michigan,Department of Electrical Engineering and Computer Science
来源
Applied Physics A | 2011年 / 102卷
关键词
Oxygen Vacancy; Schottky Barrier; Rapid Thermal Annealing; Tungsten Oxide; Bottom Electrode;
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中图分类号
学科分类号
摘要
Nanoscale memristive devices using tungsten oxide as the switching layer have been fabricated and characterized. The devices show the characteristics of a flux-controlled memristor such that the conductance change is governed by the history of the applied voltage signals, leading to synaptic behaviors including long-term potentiation and depression. The memristive behavior is attributed to the migration of oxygen vacancies upon bias which modulates the interplay between Schottky barrier emission and tunneling at the WOX/electrode interface. A physical model incorporating ion drift and diffusion effects using an internal state variable representing the area of the conductive region has been proposed to explain the observed memristive behaviors. A SPICE model has been further developed that can be directly incorporated into existing circuit simulators. This type of device can be fabricated with low-temperature processes and has potential applications in synaptic computations and as analog circuit components.
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页码:857 / 863
页数:6
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