Broadband optical properties of monolayer and bulk MoS2

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作者
Georgy A. Ermolaev
Yury V. Stebunov
Andrey A. Vyshnevyy
Dmitry E. Tatarkin
Dmitry I. Yakubovsky
Sergey M. Novikov
Denis G. Baranov
Timur Shegai
Alexey Y. Nikitin
Aleksey V. Arsenin
Valentyn S. Volkov
机构
[1] Moscow Institute of Physics and Technology,Center for Photonics and 2D Materials
[2] Skolkovo Institute of Science and Technology,Department of Physics
[3] GrapheneTek,undefined
[4] Skolkovo Innovation Center,undefined
[5] Chalmers University of Technology,undefined
[6] Donostia International Physics Center (DIPC),undefined
[7] IKERBASQUE,undefined
[8] Basque Foundation for Science,undefined
来源
npj 2D Materials and Applications | / 4卷
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摘要
Layered semiconductors such as transition metal dichalcogenides (TMDs) offer endless possibilities for designing modern photonic and optoelectronic components. However, their optical engineering is still a challenging task owing to multiple obstacles, including the absence of a rapid, contactless, and the reliable method to obtain their dielectric function as well as to evaluate in situ the changes in optical constants and exciton binding energies. Here, we present an advanced approach based on ellipsometry measurements for retrieval of dielectric functions and the excitonic properties of both monolayer and bulk TMDs. Using this method, we conduct a detailed study of monolayer MoS2 and its bulk crystal in the broad spectral range (290–3300 nm). In the near- and mid-infrared ranges, both configurations appear to have no optical absorption and possess an extremely high dielectric permittivity making them favorable for lossless subwavelength photonics. In addition, the proposed approach opens a possibility to observe a previously unreported peak in the dielectric function of monolayer MoS2 induced by the use of perylene-3,4,9,10-tetracarboxylic acid tetrapotassium salt (PTAS) seeding promoters for MoS2 synthesis and thus enables its applications in chemical and biological sensing. Therefore, this technique as a whole offers a state-of-the-art metrological tool for next-generation TMD-based devices.
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