Scaling behavior of dynamic hysteresis in multiferroic Bi5FeTi3O15 thin films

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作者
Yongtao Li
Zhaoyang Li
Xiaosong Wang
Hengshuai Li
Jie Su
Hongguang Zhang
Xuemin He
Zongtao Chi
Liqing Liu
机构
[1] Nanjing University of Posts and Telecommunications,School of Science
[2] Qingdao University,School of Electronic and Information Engineering
[3] Nanjing University of Posts and Telecommunications,College of Electronic Science and Engineering
[4] New Energy Technology Engineering Laboratory of Jiangsu Province,Shandong Provinical Key Laboratory of Optical Communication Science and Technology, School of Physical Science and Information Technology
[5] Liaocheng University,undefined
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摘要
In this study, Bi5FeTi3O15 (BFTO) thin films were obtained on silicon wafers using a sol–gel process. Advanced multiferroic properties, with a remnant polarization Pr of ~ 28 µC/cm2 and a saturated magnetization Ms of ~ 1.4 emu/cm3, were observed in a sample. The scaling of the dynamic ferroelectric hysteresis as a function of the magnitude E0 and the frequency f of an applied electrical field was investigated. The scaling relationship of the P−E loops was found to take the form 〈A〉 ∝ f−0.19E04.47 at low E0 and 〈A〉 ∝ f−0.05E01.26 at high E0. The exponents of the scaling that domain reversal in the BFTO thin films is insensitive to f at both low and high E0. This indicates the extensive potential applications of BFTO thin films in multi-state storage.
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页码:27333 / 27338
页数:5
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