Investigation of the properties of nanostructured nickel oxide NiO thin films irradiated at different γ-doses

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作者
Faycal Chandoul
Hatem Moussa
Karima Jouini
Abdelwaheb Boukhachem
Faouzi Hosni
Mohamed Slim Fayache
Raphaël Schneider
机构
[1] University of Tunis El Manar,Faculty of Mathematical, Physical and Natural Sciences of Tunis
[2] CNSTN,Laboratory on Energy and Matter for Nuclear Sciences Development
[3] Faculty of Sciences of Tunis,Unity of Physics of Semiconductor Devices (UPDS)
[4] Université de Lorraine,Laboratoire Réactions et Génie des Procédés, LRGP, UMR 7274, CNRS
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摘要
Nanostructured thin films of Nickel oxide NiO were synthesized using spray coating method. The samples were irradiated at different γ-doses by Co-60 radioisotope. The obtained films were studied using X-ray diffraction (XRD), scanning electron microscopy, UV–visible spectrophotometry, Raman spectroscopy, photoluminescence (PL) spectroscopy and FT-IR. The experimental results demonstrated that the irradiation of NiO led to significant changes. XRD and Raman spectroscopy demonstrate that the as-deposited NiO samples show a cubic structure with (111) preferred orientation common at all gamma radiation doses. The optical energy gaps of the samples were found to decrease when increasing the γ ray dose, the Eg value decreases from 3.84 eV for as deposited NiO thin film to 3.60 eV for sample irradiated at 50 kGy. Scanning electron microscope (SEM) image of sprayed NiO films shows the high porosity and the presence of microcavities in surface of films.
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页码:348 / 358
页数:10
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