Measurement of thicknesses of thin films by the Fourier spectrometry method

被引：0
|
作者：
G. G. Gorbunov
T. S. Perova
A. G. Seregin
机构：
[1] All-Russia Scientific Center,Vavilov State Optical Institute
来源：
Optics and Spectroscopy | 2001年 / 90卷
关键词：
Additional Peak; Optical Thickness; Central Peak; Secondary Peak; Path Difference;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
A Fourier spectrometry method for measuring the thickness of thin and ultrathin films with the help of an additional peak that depends on the optical thickness of the deposited film and is situated outside the region of the central peak of the interferogram is proposed. The experiment demonstrates the necessity of considering the change in optical path in the substrate that is induced by the deposited film.
引用
收藏
页码：887 / 890
页数：3
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