Systematic theoretical investigation of structures, stabilities, and electronic properties of rhodium-doped silicon clusters: Rh2Sinq (n = 1–10; q = 0, ±1)

被引:0
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作者
Shuai Zhang
Yu Zhang
Xingqiang Yang
Cheng Lu
Genquan Li
Zhiwen Lu
机构
[1] Nanyang Normal University,Department of Physics
[2] Jilin University,State Key Laboratory of Superhard Materials
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关键词
Silicon Cluster; Adiabatic Electron Affinity; Adiabatic Ionization Potential; Vertical Electron Affinity; Infrared Multiple Photon Dissociation;
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摘要
A systematic investigation of rhodium-doped silicon clusters, Rh2Sinq with n = 1–10 and q = 0, ±1, in the neutral, anionic, and cationic states is performed using density functional theory approach at B3LYP/GENECP level. According to the optimum Rh2Sinq clusters, mostly equilibrium geometries prefer the three-dimensional structures for n = 2–10. When n = 10, one Rh atom in Rh2Si100,±1 clusters completely falls into the center of Si frame, and cage-like Rh2Si100,±1 geometries are formed. The Rh2Si1,6–9+ and Rh2Si5,7,9− clusters significantly deform their corresponding neutral geometries, which are in line with the calculated ionization potential and electron affinity values. The relative stabilities of Rh2Sinq clusters for the lowest-energy structures are analyzed on the basis of binding energy, fragmentation energy, second-order energy difference, and HOMO–LUMO gaps. The theoretical results confirm that the Rh2Si6−, Rh2Si6, and Rh2Si6+ clusters are more stable than their neighboring ones. The natural population analysis reveals that the charges in Rh2Sinq clusters transfer from the Si atoms to the Rh atoms except Rh2Si+. In addition, the relationship between static polarizability and HOMO–LUMO gaps is discussed.
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页码:6180 / 6196
页数:16
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