Influence of Nitrogen on Corrosion Resistance of Thin Ti–O–N Films Deposited by Reactive Magnetron Sputtering

被引:0
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作者
E. L. Boytsova
F. A. Voroshilov
L. A. Leonova
机构
[1] Department of Nuclear Fuel Cycle,
[2] Engineering School of Nuclear Technologies,undefined
[3] Tomsk Polytechnic University,undefined
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nanofilms; titanium dioxide; doping with nitrogen; chemical resistance; corrosion resistance; gravimetry; magnetron sputtering;
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页码:1033 / 1036
页数:3
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