On the Formation of an Anti-Reflection Layer on the Surface of Single-Crystal Silicon by Ion-Beam Etching

被引：0
|
作者：
M. V. Zorina
S. A. Kraev
A. Ya. Lopatin
M. S. Mikhailenko
A. I. Okhapkin
A. A. Perekalov
A. E. Pestov
A. K. Chernyshev
N. I. Chkhalo
I. I. Kuznetsov
机构：
[1] Institute of Physics of Microstructures,
[2] Russian Academy of Sciences,undefined
[3] Institute of Applied Physics,undefined
[4] Russian Academy of Sciences,undefined
来源：
Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques | 2023年 / 17卷
关键词：
black silicon; ion etching; plasma-chemical etching; visible light; IR radiation; roughness;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
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页码：S259 / S264
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