Gas flow effects on the structure and composition of SiNx/Si/SiNx films prepared by radio-frequency magnetron sputtering

被引：0
|
作者：
Wentao Xu
Boquan Li
Toshiyuki Fujimoto
Isao Kojima
机构：
[1] National Institute of Materials and Chemical Research,Department of Analytical Chemistry
来源：
Journal of Materials Research | 2001年 / 16卷
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
The structure and composition of SiNx/Si/SiNx films were investigated by means of x-ray reflectivity, x-ray photoelectron spectroscopy, and atomic force microscopy. The three-layer films were prepared by radio-frequency magnetron sputtering under the condition of constant nitrogen flow and the argon flow. It was found that the deposition rate and surface structure of the silicon nitride films were mainly determined by the nitrogen flow rather than the argon flow. But the composition of the silicon nitride films was controlled by the gas flow ratio (FAr/FN2) used during sputtering.
引用
收藏
页码：308 / 313
页数：5
相关论文
共 50 条
  • [31] Thin films of amorphous germanium-carbon alloy prepared by radio-frequency magnetron sputtering
    Kyoto Univ, Kyoto, Japan
    J Electrochem Soc, 12 (4087-4089):
  • [32] Effect of reactive gas composition on properties of Si/LiNbO3 heterojunctions grown by radio-frequency magnetron sputtering
    Sumets, M.
    Dybov, V
    Serikov, D.
    Belonogov, E.
    Seredin, P.
    Goloshchapov, D.
    Grebennikov, A.
    Ievlev, V
    JOURNAL OF SCIENCE-ADVANCED MATERIALS AND DEVICES, 2020, 5 (04): : 512 - 519
  • [33] Effect of doping Mg on the structure and optical properties of LiNbO3 films prepared by radio-frequency magnetron sputtering
    Zhao, Li
    Shi, Laixiang
    Wang, Ji
    Yan, Jun
    Chen, Yunlin
    Zheng, Yanqing
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2020, 108
  • [34] Local structure and structural properties of vanadium oxide thin films prepared by radio-frequency reactive magnetron sputtering at various oxygen flow rate
    Thangdee, Piyaporn
    Chongsereecharoen, Ekachai
    Chunjaemsri, Thanun
    Ekwongsa, Chinawat
    Kidkhunthod, Pinit
    Chanlek, Narong
    Wongdamnern, Natthapong
    Manyum, Prapan
    Rujirawat, Saroj
    Yimnirun, Rattikorn
    FERROELECTRICS, 2021, 586 (01) : 213 - 224
  • [35] Amorphous, silicide, and crystalline Fe films grown on Si(001) by radio-frequency magnetron sputtering
    Je, JH
    Kim, HK
    Noh, DY
    JOURNAL OF MATERIALS RESEARCH, 1999, 14 (04) : 1658 - 1663
  • [36] Amorphous, Silicide, and Crystalline Fe Films Grown on Si(001) by Radio-frequency Magnetron Sputtering
    J. H. Je
    H. K. Kim
    D. Y. Noh
    Journal of Materials Research, 1999, 14 : 1658 - 1663
  • [37] Effects of hydrogen on film properties of diamond-like carbon films prepared by reactive radio-frequency magnetron sputtering using hydrogen gas
    Mikami, T
    Nakazawa, H
    Kudo, M
    Mashita, M
    THIN SOLID FILMS, 2005, 488 (1-2) : 87 - 92
  • [38] Structure and biological activity of radio-frequency magnetron sputtering prepared hydroxyapatite coating on titanium substrate
    Wang, G.-Q. (wangguoqing@mail.neu.edu.cn), 2013, Central South University, Lushan Nanlu, Changsha, 410043, China (18):
  • [39] OPTICAL-PROPERTIES AND STRUCTURE OF MICROCRYSTALLINE HYDROGENATED SILICON PREPARED BY RADIO-FREQUENCY MAGNETRON SPUTTERING
    LOGOTHETIDIS, S
    KIRIAKIDIS, G
    JOURNAL OF APPLIED PHYSICS, 1988, 64 (05) : 2389 - 2398
  • [40] STRUCTURE AND COMPOSITION OF CDSBTE THIN-FILMS GROWN BY RADIO-FREQUENCY SPUTTERING
    ALVAREZFREGOSO, O
    SANCHEZSINENCIO, F
    MENDOZAALVAREZ, JG
    ZELAYA, O
    FARIAS, MH
    COTAARAIZA, L
    SOTO, G
    REVISTA MEXICANA DE FISICA, 1994, 40 (03) : 418 - 426
12345