Effect of additives on the morphologies of cuprous oxides by electrodeposition

被引：0
|
作者：
Xianyong Zhu
机构：
[1] University of Jilin,College of Mechanical Science and Engineering
来源：
Journal of Wuhan University of Technology-Mater. Sci. Ed. | 2012年 / 27卷
关键词：
crystal morphology; electrochemical growth; thin film; cuprous oxide;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Cuprous oxides with different morphologies were formed on F-doped tin oxide (FTO) covered glass substrates by potentiostatic deposition of cupric acetate. The effects of CTAB and Cl− on the crystal morphologies of cuprous oxide were studied. Different crystal morphologies of cuprous oxides were obtained by the change of the concentrations of CTAB and Cl. The flowerlike and cubic morphologies of Cu2O crystals were obtained when using higher concentration of CTAB and KCl, respectively. Photoelectrochemical properties of the Cu2O thin films prepared in the system were also studied.
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页码：1096 / 1099
页数：3
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