Microstructure and Density of Mo Films in Multilayer Mo/Si Mirrors

被引：0
|
作者：
Yu. A. Vainer
S. A. Garakhin
V. N. Polkovnikov
N. N. Salashchenko
M. V. Svechnikov
N. I. Chkhalo
P. A. Yunin
机构：
[1] Institute for Physics of Microstructures,
[2] Russian Academy of Sciences,undefined
来源：
Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques | 2019年 / 13卷
关键词：
X-ray multilayer mirror; X-ray diffraction; thin film density; coherent-scattering region; Williamson–Hall plot; aperiodic mirror;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：8 / 13
页数：5
相关论文
共 50 条
  • [31] Internal Stresses in Mo/Y Multilayer Mirrors
    Kvashennikov, D. S.
    Vainer, Yu A.
    Zuev, S. Yu
    Polkovnikov, V. N.
    JOURNAL OF SURFACE INVESTIGATION, 2019, 13 (02): : 177 - 181
  • [32] Enhancement of the reflectivity of Mo/Si multilayer soft X-ray mirrors by mirrors by thermal treatment
    Kloidt, A.
    Stock, H.J.
    Nolting, K.
    Kleineberg, U.
    Schmiedeskamp, B.
    Heinzmann, U.
    Vide, les Couches Minces, 1991, (259 Supp):
  • [33] Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography
    Mirkarimi, PB
    Bajt, S
    Wall, MA
    APPLIED OPTICS, 2000, 39 (10) : 1617 - 1625
  • [34] Mo/Si and Mo/Be multilayer thin films on zerodur substrates for extreme-ultraviolet lithography
    Mirkarimi, Paul B.
    Bajt, Sasa
    Wall, Mark A.
    Applied Optics, 2000, 39 (10): : 1617 - 1625
  • [35] Application of reactive ion etching to the fabrication of microstructure on Mo/Si multilayer
    Le, ZC
    Dreeskornfeld, L
    Rahn, S
    Segler, R
    Kleineberg, U
    Heinzmann, U
    CHINESE PHYSICS LETTERS, 1999, 16 (09): : 665 - 666
  • [36] Effects of Mo Single-Layer Thickness on Microstructure and Tribological Behavior of WSx/Mo/a-C/Mo Multilayer Films
    Zheng, Xiao-Hua
    Wang, Tao
    Wang, Gong-Qi
    Zhang, Wan-Kun
    Yang, Fang-Er
    ADVANCED ENGINEERING MATERIALS, 2021, 23 (06)
  • [37] Nanopatterning of Au absorber films on Mo/Si EUV multilayer mirrors by STM lithography in self-assembled monolayers
    Sundermann, M
    Hartwich, J
    Rott, K
    Meyners, D
    Majkova, E
    Kleineberg, U
    Grunze, M
    Heinzmann, U
    SURFACE SCIENCE, 2000, 454 (01) : 1104 - 1109
  • [38] HEAT-RESISTANCE OF MO/SI, MOSI2/SI, AND MO5SI3/SI MULTILAYER SOFT-X-RAY MIRRORS
    TAKENAKA, H
    KAWAMURA, T
    ISHII, Y
    ASAGIRI, S
    JOURNAL OF APPLIED PHYSICS, 1995, 78 (09) : 5227 - 5230
  • [39] VARIATION IN STRESS WITH BACKGROUND PRESSURE IN SPUTTERED MO/SI MULTILAYER FILMS
    WINDT, DL
    BROWN, WL
    VOLKERT, CA
    WASKIEWICZ, WK
    JOURNAL OF APPLIED PHYSICS, 1995, 78 (04) : 2423 - 2430
  • [40] Influence of Thermal Annealing on the Properties of Multilayer Mo/Be Mirrors
    R. M. Smertin
    S. A. Garakhin
    S. Yu. Zuev
    A. N. Nechai
    V. N. Polkovnikov
    N. N. Salashchenko
    M. V. Svechnikov
    M. G. Sertsu
    A. Sokolov
    N. I. Chkhalo
    F. Schäfers
    P. A. Yunin
    Technical Physics, 2019, 64 : 1692 - 1697
12345