Effects of Different Variants of Plasma Nitriding on the Properties of the Nitrided Layer

Several process variants of plasma nitriding can be distinguished depending on the location of the voltage introduction. The aim of this study is to compare three different variants of plasma nitriding (DC plasma nitriding, active screen plasma nitriding, and active screening process with bias voltage application) extended by the study of the coverage of active screen on C45E unalloyed steel, using two different N2-H2 gas mixtures. The thickness of the compound layer was measured using a scanning electron microscope, the phase analysis was performed by an x-ray diffractometer, and the nitrogen contents were analyzed by glow discharge optical electron spectroscopy. The results showed that the layer thickness and the surface hardness were higher by using active screen-biased plasma nitriding with high N2 content gas mixture. Besides, the lid of the active screen did not influence significantly the chemical composition of the compound layer.