Glow discharge mass spectrometry

被引:0
|
作者
Volker Hoffmann
Martin Kasik
Peter K. Robinson
Cornel Venzago
机构
[1] Leibniz Institute for Solid State and Materials Research Dresden,
[2] Shiva Technologies,undefined
[3] Inc.,undefined
[4] Mass Spectrometry International,undefined
[5] degussa,undefined
[6] AQura GmbH,undefined
来源
关键词
Glow discharge mass spectrometry; Depth profile; Temperature; Fast flow; Pulse;
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学科分类号
摘要
Over the past twenty years or so, glow discharge mass spectrometry (GDMS) has become the industry standard for the analysis of trace elements in metals and semiconductors. A review of its history is followed by a picture of the present situation and a look to where the future may lie. Applications are summarised, including the ability of GDMS to offer depth-resolved data and non-conductor analysis, and the well-documented quantitative nature of the results is reviewed. The effects resulting from the physical properties of the analyte material are discussed at length. Finally, recent work such as “fast flow” sources and pulsed glow discharges is reviewed.
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页码:173 / 188
页数:15
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