Monte Carlo study of electron transport in strained silicon inversion layers

被引:0
|
作者
E. Ungersboeck
H. Kosina
机构
[1] Vienna University of Technology,Institut für Mikroelektronik
[2] TU Wien,undefined
来源
关键词
Monte Carlo simulation; Degeneracy effects; Strain; Mobility enhancement;
D O I
暂无
中图分类号
学科分类号
摘要
The effect of degeneracy both on the phonon-limited mobility and the effective mobility including surface-roughness scattering in unstrained and biaxially tensile strained Si inversion layers is analyzed. We introduce a new method for the inclusion of the Pauli principle in a Monte Carlo algorithm. We show that incidentally degeneracy has a minor effect on the bulk effective mobility, despite non-degenerate statistics yields unphysical subband populations and an underestimation of the mean electron energy. The effective mobility of strained inversion layers slightly increases at high inversion layer concentrations when taking into account degenerate statistics.
引用
收藏
页码:79 / 83
页数:4
相关论文
共 50 条
  • [31] MONTE-CARLO INVESTIGATION OF MINORITY ELECTRON-TRANSPORT IN SILICON
    DEWEY, J
    OSMAN, MA
    APPLIED PHYSICS LETTERS, 1993, 62 (02) : 187 - 189
  • [33] Monte Carlo simulation of double-gate silicon-on-insulator inversion layers: The role of volume inversion
    Gamiz, F
    Fischetti, MV
    JOURNAL OF APPLIED PHYSICS, 2001, 89 (10) : 5478 - 5487
  • [34] Electron transport in strained Si inversion layers grown on SiGe-on-insulator substrates
    Gámiz, F
    Cartujo-Cassinello, P
    Roldán, JB
    Jiménez-Molinos, F
    JOURNAL OF APPLIED PHYSICS, 2002, 92 (01) : 288 - 295
  • [35] LOGARITHMIC CORRECTIONS AND ELECTRON-TRANSPORT IN SILICON INVERSION-LAYERS
    PEPPER, M
    DAVIES, RA
    NAKAI, M
    UREN, MJ
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1981, 26 (03): : 410 - 411
  • [36] Monte Carlo study of electron transport in Inversion layer of 6H-SiC MOS structure
    Shang, Y.C.
    Zhang, Y.M.
    Zhang, Y.M.
    2001, Chinese Institute of Electronics (29):
  • [37] Monte Carlo study on interface roughness dependence of electron mobility in 6H-SiC inversion layers
    Shang, Y.C.
    Zhang, Y.M.
    Zhang, Y.M.
    Wuli Xuebao/Acta Physica Sinica, 2001, 50 (07):
  • [38] Monte Carlo study on interface roughness dependence of electron mobility in 6H-SiC inversion layers
    Shang, YC
    Zhang, YM
    Zhang, YM
    ACTA PHYSICA SINICA, 2001, 50 (07) : 1350 - 1354
  • [39] Characterization of electron transport at high fields in silicon-on-insulator devices:: a Monte Carlo study
    Roldán, JB
    Gámiz, I
    Roldán, A
    Rodríguez, N
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2006, 21 (01) : 81 - 86
  • [40] k&middotp and Monte Carlo studies of hole mobility in strained-Si pMOS inversion layers
    Institute of Microelectronics, Tsinghua University, Beijing 100084, China
    Pan Tao Ti Hsueh Pao, 2006, 12 (2144-2149):