Ionization of sputtered metal atoms in a microwave ECR plasma source

被引：0
|
作者：
N. P. Poluektov
V. N. Kharchenko
I. G. Usatov
机构：
[1] Moscow State University of Forestry,
来源：
Plasma Physics Reports | 2001年 / 27卷
关键词：
Aluminum; Spectroscopy; Microwave; Spatial Distribution; Xenon;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
The ionization of sputtered aluminum atoms in the plasma of a microwave ECR discharge intended for metal coating of submicron-size structures in microelectronics is studied. The spatial distributions of xenon plasma parameters and their variations under the action of metal atoms are investigated using probe and optical emission spectroscopy techniques.
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页码：625 / 633
页数：8
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