Transparent and conducting ZnO films prepared by reactive pulsed laser deposition

被引：0
|
作者：
Raid A. Ismail
Bassam G. Rasheed
Evan T. Salm
Mukram Al-Hadethy
机构：
[1] University of Technology,Faculty of Education
[2] Haduramout university,undefined
来源：
Journal of Materials Science: Materials in Electronics | 2007年 / 18卷
关键词：
Oxygen Pressure; Pulse Laser Deposition; Pulse Laser Deposition System; Reactive Pulse Laser Deposition; Background Oxygen Pressure;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Undoped ZnO films were prepared on glass substrates without any post-deposition heat treatment using a pulsed Nd:YAG laser ablation of Zn target in the presence of oxygen as reactive atmosphere. Structural, optical, and electrical properties of these films have been investigated as functions of oxygen pressure during deposition. Transparent conducting ZnO films, formed at 120 torr of oxygen pressure, showed an electrical resistivity of 0.27 Ωcm, a mean optical transmittance of 80%, and an optical band gap of 3.25 eV.
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页码：397 / 400
页数：3
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