Transparent and conducting ZnO films prepared by reactive pulsed laser deposition

被引：40
|
作者：
Ismail, Raid A. [1 ]
Rasheed, Bassam G. [1 ]
Salm, Evan T. [1 ]
Al-Hadethy, Mukram [1 ]
机构：
[1] Univ Technol Baghdad, Baghdad, Iraq
来源：
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS | 2007年 / 18卷 / 04期
关键词：
D O I：
10.1007/s10854-006-9046-y
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Undoped ZnO films were prepared on glass substrates without any post-deposition heat treatment using a pulsed Nd:YAG laser ablation of Zn target in the presence of oxygen as reactive atmosphere. Structural, optical, and electrical properties of these films have been investigated as functions of oxygen pressure during deposition. Transparent conducting ZnO films, formed at 120 torr of oxygen pressure, showed an electrical resistivity of 0.27 Omega cm, a mean optical transmittance of 80%, and an optical band gap of 3.25 eV.
引用
收藏
页码：397 / 400
页数：4
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