Laser Plasma-Chemical Etching of Polycrystalline Diamond and Single-Crystal Sapphire

被引：0
|
作者：
Red’kin S.V. [1 ,2 ]
Mal’tsev P.P. [1 ,2 ]
Kondratenko V.S. [2 ]
Yuzeeva N.A. [2 ]
机构：
[1] Mokerov Institute of Ultra High Frequency Semiconductor Electronics (IUHFSE), Russian Academy of Sciences, Moscow
[2] MIREA—Russian Technological University (RTU MIREA), Moscow
来源：
Russian Microelectronics | 2022年 / 51卷 / 06期
关键词：
diamond; laser; plasma-chemical etching; sapphire;
D O I：
10.1134/S1063739722050067
中图分类号：
学科分类号：
摘要：
Abstract: This paper presents the results of experiments on the laser plasma-chemical etching of diamond and sapphire in relation to the technological process of separating wafers into crystals with electronic devices formed on their surface with the topological design nanonorms. © 2022, Pleiades Publishing, Ltd.
引用
收藏
页码：435 / 438
页数：3
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