Sapphire plasma-chemical etching application to profiled sensing elements development

被引:0
|
作者
机构
来源
Prib Sist Upr | / 11卷 / 50-52期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
下载
收藏
相关论文
共 50 条
  • [1] Laser Plasma-Chemical Etching of Polycrystalline Diamond and Single-Crystal Sapphire
    Red’kin S.V.
    Mal’tsev P.P.
    Kondratenko V.S.
    Yuzeeva N.A.
    Russian Microelectronics, 2022, 51 (06): : 435 - 438
  • [2] PROBLEMS IN PLASMA-CHEMICAL ETCHING FOR MICROELECTRONICS
    ORLIKOVSKII, AA
    SLOVETSKII, DI
    SOVIET MICROELECTRONICS, 1987, 16 (06): : 263 - 276
  • [3] PLASMA-CHEMICAL ETCHING OF GRAPHITE IN SIMILAR SYSTEMS
    MAKSIMOV, AI
    NIKIFOROV, AY
    SVETTSOV, VI
    KOCHETKOVA, TE
    HIGH ENERGY CHEMISTRY, 1985, 19 (06) : 451 - 452
  • [4] Numerical simulation of plasma-chemical etching reactors
    Grigoryev, YN
    Gorobchuk, AG
    1997 21ST INTERNATIONAL CONFERENCE ON MICROELECTRONICS - PROCEEDINGS, VOLS 1 AND 2, 1997, : 485 - 488
  • [5] Plasma-Chemical Etching of InP with Trichloro-Trifluoroethane.
    Novikova, E.M.
    Kuznetsov, G.D.
    Ershova, S.A.
    Neorganiceskie materialy, 1986, 22 (11): : 1769 - 1772
  • [6] Analytical model of plasma-chemical etching in planar reactor
    Veselov, D. S.
    Bakun, A. D.
    Voronov, Yu A.
    Kireev, V. Yu
    Vasileva, O. V.
    XIX CONFERENCE ON PLASMA SURFACE INTERACTIONS, 2016, 748
  • [7] EXPERIMENTAL RESEARCH OF ICP REACTOR FOR PLASMA-CHEMICAL ETCHING
    Dudin, S., V
    Zykov, A., V
    Dahov, A. N.
    Farenik, V., I
    PROBLEMS OF ATOMIC SCIENCE AND TECHNOLOGY, 2006, (06): : 189 - 191
  • [8] Atmospheric pressure plasma-chemical etching and deposition. Application in crystalline silicon photovoltaics
    Lopez, Elena
    Linaschke, Dorit
    Dresler, Birte
    Dani, Ines
    Leyens, Christoph
    Beyer, Eckhard
    VAKUUM IN FORSCHUNG UND PRAXIS, 2011, 23 (06) : 12 - 16
  • [9] ANISOTROPIC PLASMA-CHEMICAL ETCHING BY AN ELECTRON-BEAM-GENERATED PLASMA
    VERHEY, TR
    ROCCA, JJ
    BOYER, PK
    JOURNAL OF APPLIED PHYSICS, 1988, 63 (07) : 2463 - 2466
  • [10] Influence of the skin effect on the structure of relief-phase optical elements obtained by plasma-chemical etching
    Odinokov, S. B.
    Sagatelyan, G. R.
    Kovalev, M. S.
    Bugorkov, K. N.
    JOURNAL OF OPTICAL TECHNOLOGY, 2019, 86 (09) : 596 - 602