Optical characterization of ZnO thin films deposited by RF magnetron sputtering method

被引：0
|
作者：
Ning Tang
JinLiang Wang
HengXing Xu
HongYong Peng
Chao Fan
机构：
[1] Beihang University,Department of Physics, School of Science
来源：
Science in China Series E: Technological Sciences | 2009年 / 52卷
关键词：
ZnO thin films; RF magnetron sputtering; XRD; ultraviolet transmission spectrum;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
This study investigated the process parameter effects on the structural and optical properties of ZnO thin film using radio frequency (RF) magnetron sputtering on amorphous glass substrates. The process parameters included RF power and working pressure. Results show that RF power was increased to promote the crystalline quality and decrease ZnO thin film defects. However, when the working pressure was increased to 3 Pa the ZnO thin film crystalline quality became worse. At a 200 W RF power and 1 Pa working pressure, the ZnO thin film with an optical band gap energy of 3.225 eV was obtained.
引用
收藏
页码：2200 / 2203
页数：3
相关论文
共 50 条
  • [21] Influence of substrate temperature on the optical and piezoelectric properties of ZnO thin films deposited by rf magnetron sputtering
    Kang, Seong Jun
    Joung, Yang Hee
    [J]. APPLIED SURFACE SCIENCE, 2007, 253 (17) : 7330 - 7335
  • [22] The optical and electrical properties of ZnO:Al thin films deposited at low temperatures by RF magnetron sputtering
    Tang, Ping
    Li, Bing
    Feng, Lianghuan
    [J]. CERAMICS INTERNATIONAL, 2018, 44 (04) : 4154 - 4157
  • [23] Structural characterization of ZnO thin films deposited by dc magnetron sputtering
    Kiriakidis, G.
    Suchea, M.
    Christoulakis, S.
    Horvath, P.
    Kitsopoulos, T.
    Stoemenos, J.
    [J]. THIN SOLID FILMS, 2007, 515 (24) : 8577 - 8581
  • [24] Effects of sputtering power on Al doped ZnO thin films deposited by RF magnetron sputtering
    Gao, Li-Hua
    Zheng, Yu-Ying
    [J]. Gongneng Cailiao/Journal of Functional Materials, 2015, 46 (08): : 08028 - 08030
  • [25] Optical properties of ZnO homoepitaxial thin films grown by an rf-magnetron sputtering method
    Wakaiki, S.
    Kim, D.
    Komura, S.
    Mizoguchi, K.
    Nakayama, M.
    [J]. PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 3, NO 10, 2006, 3 (10): : 3504 - +
  • [26] Structural and optical properties of ZnS thin films deposited by RF magnetron sputtering
    Dong Hyun Hwang
    Jung Hoon Ahn
    Kwun Nam Hui
    Kwan San Hui
    Young Guk Son
    [J]. Nanoscale Research Letters, 7
  • [27] Structural and optical properties of silver thin films deposited by RF magnetron sputtering
    Rizzo, A
    Tagliente, MA
    Alvisi, M
    Scaglione, S
    [J]. THIN SOLID FILMS, 2001, 396 (1-2) : 29 - 35
  • [28] Structural and optical properties of ZnS thin films deposited by RF magnetron sputtering
    Hwang, Dong Hyun
    Ahn, Jung Hoon
    Hui, Kwun Nam
    Hui, Kwan San
    Son, Young Guk
    [J]. NANOSCALE RESEARCH LETTERS, 2012, 7 : 1 - 7
  • [29] Optical properties of thin films deposited by reactive-rf-magnetron sputtering
    Yoshida, K
    Kamimura, T
    Ochi, K
    Kaku, S
    Yoshida, H
    Fujita, H
    Tani, F
    Sunagawa, M
    Okamoto, T
    [J]. LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 1996, 1997, 2966 : 225 - 225
  • [30] Characterization of Ga-doped ZnO thin films prepared by RF magnetron sputtering method
    Yun, Young-Hoon
    [J]. JOURNAL OF THE KOREAN CRYSTAL GROWTH AND CRYSTAL TECHNOLOGY, 2021, 31 (02): : 73 - 77
12345