Optical characterization of ZnO thin films deposited by RF magnetron sputtering method

被引：0
|
作者：
Ning Tang
JinLiang Wang
HengXing Xu
HongYong Peng
Chao Fan
机构：
[1] Beihang University,Department of Physics, School of Science
来源：
Science in China Series E: Technological Sciences | 2009年 / 52卷
关键词：
ZnO thin films; RF magnetron sputtering; XRD; ultraviolet transmission spectrum;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
This study investigated the process parameter effects on the structural and optical properties of ZnO thin film using radio frequency (RF) magnetron sputtering on amorphous glass substrates. The process parameters included RF power and working pressure. Results show that RF power was increased to promote the crystalline quality and decrease ZnO thin film defects. However, when the working pressure was increased to 3 Pa the ZnO thin film crystalline quality became worse. At a 200 W RF power and 1 Pa working pressure, the ZnO thin film with an optical band gap energy of 3.225 eV was obtained.
引用
收藏
页码：2200 / 2203
页数：3
相关论文
共 50 条
  • [1] Optical characterization of ZnO thin films deposited by RF magnetron sputtering method
    TANG Ning
    [J]. Science China Technological Sciences, 2009, (08) : 2200 - 2203
  • [2] Optical characterization of ZnO thin films deposited by RF magnetron sputtering method
    Tang Ning
    Wang JinLiang
    Xu HengXing
    Peng HongYong
    Fan Chao
    [J]. SCIENCE IN CHINA SERIES E-TECHNOLOGICAL SCIENCES, 2009, 52 (08): : 2200 - 2203
  • [3] Structural and Optical Characterization of ZnO Thin Films Deposited by Reactive rf Magnetron Sputtering
    Youssef, S.
    Combette, P.
    Podlecki, J.
    Al Asmar, R.
    Foucaran, A.
    [J]. CRYSTAL GROWTH & DESIGN, 2009, 9 (02) : 1088 - 1094
  • [4] Structural and optical characterization of Cu doped ZnO thin films deposited by RF magnetron sputtering
    Toma, Maria
    Ursulean, Nicolae
    Marconi, Daniel
    Pop, Aurel
    [J]. JOURNAL OF ELECTRICAL ENGINEERING-ELEKTROTECHNICKY CASOPIS, 2019, 70 (07): : 127 - 131
  • [5] Optical Characterization of Mg-doped ZnO Thin Films Deposited by RF Magnetron Sputtering Technique
    Singh, Satyendra Kumar
    Hazra, Purnima
    Tripathi, Shweta
    Chakrabarti, P.
    [J]. INTERNATIONAL CONFERENCE ON CONDENSED MATTER AND APPLIED PHYSICS (ICC 2015), 2016, 1728
  • [6] ZnO films deposited by RF magnetron sputtering
    Li, J
    Wu, ST
    Kang, JY
    [J]. SMIC-XIII: 2004 13th International Conference on Semiconducting & Insulating Materials, 2004, : 77 - 80
  • [7] Structural and optical characterization of high-quality ZnO thin films deposited by reactive RF magnetron sputtering
    Zhang, X. L.
    Hui, K. N.
    Hui, K. S.
    Singh, Jai
    [J]. MATERIALS RESEARCH BULLETIN, 2013, 48 (03) : 1093 - 1098
  • [8] Growth evolution of ZnO thin films deposited by RF magnetron sputtering
    Rosa, A. M.
    da Silva, E. P.
    Amorim, E.
    Chaves, M.
    Catto, A. C.
    Lisboa-Filho, P. N.
    Bortoleto, J. R. R.
    [J]. 14TH LATIN AMERICAN WORKSHOP ON PLASMA PHYSICS (LAWPP 2011), 2012, 370
  • [9] Characterization of N type Si doped ZnO and ZnO thin films deposited by RF magnetron sputtering
    Claypoole, Jesse
    Altwerger, Mark
    Flottman, Spencer
    Efstathiadis, Harry
    [J]. 2018 IEEE NANOTECHNOLOGY SYMPOSIUM (ANTS), 2018,
  • [10] Investigation of optical properties of ZnO Films deposited by RF magnetron sputtering
    Li, Shuang
    Wang, Feng-xiang
    Fu, Gang
    Ji, Yan-ju
    Zhao, Jun-qing
    [J]. OPTOELECTRONIC MATERIALS, PTS 1AND 2, 2010, 663-665 : 215 - 218
12345