A Selective BP/Si Contact Formed by Low-Temperature Plasma-Enhanced Atomic Layer Deposition

被引：0
|
作者：
A. S. Gudovskikh
D. A. Kudryashov
A. I. Baranov
A. V. Uvarov
I. A. Morozov
机构：
[1] Zh.I. Alferov St. Petersburg National Research Academic University,
[2] Russian Academy of Sciences,undefined
[3] St. Petersburg Electrotechnical University “LETI”,undefined
来源：
Technical Physics Letters | 2021年 / 47卷
关键词：
boron phosphide; silicon; selective contact; solar cell.;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
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页码：96 / 98
页数：2
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