Hydrophobic modification of bacterial cellulose using oxygen plasma treatment and chemical vapor deposition

被引：0
|
作者：
Salomé Leal
Cecília Cristelo
Sara Silvestre
Elvira Fortunato
Aureliana Sousa
Anabela Alves
D. M. Correia
S. Lanceros-Mendez
Miguel Gama
机构：
[1] University of Minho,Centre of Biological Engineering
[2] Universidade Nova de Lisboa,Centro/Departamento de Física
[3] Faculdade de Ciências e Tecnologias,BCMaterials, Basque Center for Materials, Applications and Nanostructures
[4] INEB – Biomedical Engineering Institute,undefined
[5] University of Minho,undefined
[6] UPV/EHU Science Park,undefined
[7] IKERBASQUE,undefined
[8] Basque Foundation for Science,undefined
来源：
Cellulose | 2020年 / 27卷
关键词：
Bacterial cellulose; Chemical vapor deposition; Trichloromethylsilane; Oxygen plasma; Hydrophobic; Surface modification;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：10733 / 10746
页数：13
相关论文
共 50 条
  • [41] PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION
    HESS, DW
    [J]. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1986, 192 : 9 - IAEC
  • [42] Plasma chemical vapor deposition of diamond films
    Bachmann, PK
    [J]. PHYSICS OF DIAMOND, 1997, 135 : 45 - 71
  • [43] Characteristics of SiOx-containing hard film prepared by low temperature plasma enhanced chemical vapor deposition using hexamethyldisilazane or vinyltrimethylsilane and post oxygen plasma treatment
    Wei, Yi-Syuan
    Liu, Wan-Yu
    Wu, Hsin-Ming
    Chen, Ko-Shao
    Cech, Vladimir
    [J]. MATERIALS CHEMISTRY AND PHYSICS, 2017, 189 : 183 - 190
  • [44] Modification of diamond film growth by a negative bias voltage in microwave plasma chemical vapor deposition
    Schreck, M
    Baur, T
    Fehling, R
    Muller, M
    Stritzker, B
    Bergmaier, A
    Dollinger, G
    [J]. DIAMOND AND RELATED MATERIALS, 1998, 7 (2-5) : 293 - 298
  • [45] Effects of Plasma Treatment on Carbon Nanowalls Grown by Microwave Plasma Enhanced Chemical Vapor Deposition
    Jung, Yong Ho
    Kang, Hyunil
    Choi, Won Seok
    Joung, Yeun-Ho
    Choi, Young-Kwan
    [J]. JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2016, 16 (05) : 5291 - 5294
  • [46] Conformal Growth of Ultrathin Hydrophilic Coatings on Hydrophobic Surfaces Using Initiated Chemical Vapor Deposition
    Rumrill, Shayna M.
    Agarwal, Vivek
    Lau, Kenneth K. S.
    [J]. LANGMUIR, 2021, 37 (25) : 7751 - 7759
  • [47] Deposition of micro crystalline silicon films using microwave plasma enhanced chemical vapor deposition
    Altmannshofer, Stephan
    Miller, Bastian
    Holleitner, Alexander W.
    Boudaden, Jamila
    Eisele, Ignaz
    Kutter, Christoph
    [J]. THIN SOLID FILMS, 2018, 645 : 180 - 186
  • [48] DEPOSITION OF SMOOTH, ORIENTED DIAMOND FILMS USING MICROWAVE PLASMA CHEMICAL VAPOR-DEPOSITION
    CELII, FG
    WHITE, D
    PURDES, AJ
    [J]. THIN SOLID FILMS, 1992, 212 (1-2) : 140 - 149
  • [49] Deposition of nanostructured thin films using an inductively coupled plasma chemical vapor deposition technique
    Lee, YC
    Tan, OK
    Tse, MS
    Srivastava, A
    [J]. CERAMICS INTERNATIONAL, 2004, 30 (07) : 1869 - 1872
  • [50] Combinatorial Deposition of Microcrystalline Silicon Films Using Multihollow Discharge Plasma Chemical Vapor Deposition
    Koga, Kazunori
    Matsunaga, Takeaki
    Kim, Yeonwon
    Nakahara, Kenta
    Yamashita, Daisuke
    Matsuzaki, Hidefumi
    Kamataki, Kunihiro
    Uchida, Giichiro
    Itagaki, Naho
    Shiratani, Masaharu
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2012, 51 (01)
12345