Using Machine Learning Methods to Predict the Magnitude and the Direction of Mask Fragments Displacement in Optical Proximity Correction (OPC)

被引：0
|
作者：
P. E. Tryasoguzov
A. V. Kuzovkov
I. M. Karandashev
G. S. Teplov
机构：
[1] Molecular Electronics Research Institute (JSC MERI),
[2] Scientific Research Institute for System Analysis,undefined
[3] Russian Academy of Sciences,undefined
[4] Moscow Institute of Physics and Technology (MIPT University),undefined
[5] Рeoples’ Friendship University of Russia (RUDN University),undefined
来源：
Optical Memory and Neural Networks | 2021年 / 30卷
关键词：
optical proximity correction; machine learning; artificial neural networks; computational photolithography;
D O I：
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中图分类号：
学科分类号：
摘要：
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页码：291 / 297
页数：6
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