A study of the effect of the fabrication process on diffusion in a layered thin film

被引：0

作者：

Hirasawa T. ^{[1
]}

Kotera H. ^{[1
]}

Yamamoto T. ^{[1
]}

Shima S. ^{[1
]}

机构：

[1] Department of Mechanical Engineering, Kyoto University, Kyoto, 606-8501, Yoshidahonmachi, Sakyou-ku

来源：

Microsystem Technologies | 1999年 / 5卷 / 4期

关键词：

Spectroscopy; Silicon; Mechanical Property; Thin Film; SiO2;

D O I：

10.1007/s005420050159

中图分类号：

学科分类号：

摘要：

A diffusion layer that is likely to be formed at the interfaces of the multi-layered thin film would affect its overall mechanical properties; the thinner the thin film, the more significant would be the effect. We measure the distribution of atoms and estimate the thickness of the diffusion layer at the vicinity of the interfaces among thin films of Al and SiO2 and silicon wafer with the aid of Auger electron spectroscopy (AES). The effect of heat treatment after fabrication of the thin films on the diffusion is also investigated.

引用

页码：169 / 172

页数：3

共 50 条

[21] Improvement of thin film transformer characteristics by use of a new fabrication process
Zhang, HW
Zhong, ZY
Liu, YL
Wang, HC
VACUUM, 1999, 55 (3-4) : 197 - 200
[22] DESIGN AND FABRICATION OF THIN-FILM HEADS BASED ON A DRY PROCESS
HANAZONO, M
NARISHIGE, S
HARA, S
MITSUOKA, K
KAWAKAMI, K
SUGITA, Y
KUWATSUKA, S
KOBAYASHI, T
OHURA, M
TSUJI, Y
JOURNAL OF APPLIED PHYSICS, 1987, 61 (08) : 4157 - 4162
[23] Process and fabrication of a lead zirconate titanate thin film pressure sensor
Zakar, E
Dubey, M
Piekarski, B
Conrad, J
Piekarz, R
Widuta, R
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2001, 19 (01): : 345 - 348
[24] Nanomaterials fabrication using advanced thin film deposition and nanohybrid process
Kim, Hyungjun
Lee, Han-Bo-Ram
Kim, Woo-Hee
Park, Sang-Joon
Hwang, In Chan
2009 IEEE NANOTECHNOLOGY MATERIALS AND DEVICES CONFERENCE, 2009, : 3 - 4
[25] Development of the Photolithography Process for the Fabrication of a Flexible Thin Film Thermoelectric Generator
Terekhov D.Y.
Pepelyaev D.V.
Yakubov A.O.
Babich A.V.
Sherchenkov A.A.
Russian Microelectronics, 2023, 52 (07) : 581 - 586
[26] Fabrication of patterned TiO2 thin film by a wet process
Jin-Ho Kim
Mi Jai Lee
Seiki Kim
Jonghee Hwang
Tae-Young Lim
Sae-Hoon Kim
Metals and Materials International, 2012, 18 : 833 - 837
[27] Combinatorial fabrication process for a-Si:H thin film transistors
Aiyer, HN
Nishioka, D
Maruyama, R
Shinno, H
Matsuki, N
Miyazaki, K
Fujioka, H
Koinuma, H
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 2001, 40 (1AB): : L81 - L83
[28] Fabrication of homojunction using spray pyrolised CdS thin film by copper diffusion
Varkey, KP
Vijayakumar, KP
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1997, 36 (4A): : L394 - L396
[29] Fabrication of p-type fin field-effect-transistors by solid-phase boron diffusion process using thin film doping sources
Cho, Won-Ju
Koo, Sang-Mo
THIN SOLID FILMS, 2007, 515 (7-8) : 3709 - 3713
[30] Process study and optimization for fabrication of poly-Si thin-film transistors on plastic substrates
Chung, W
Lemmi, F
Smith, PM
Sasagawa, T
JOURNAL OF THE SOCIETY FOR INFORMATION DISPLAY, 2005, 13 (07) : 555 - 561

← 1 2 3 4 5 →