Silicide characterization at alumina–niobium interfaces

被引：0

作者：

J. T. McKeown

V. R. Radmilovic

R. Gronsky

A. M. Glaeser

机构：

[1] Lawrence Livermore National Laboratory,Condensed Matter and Materials Division

[2] Lawrence Berkeley National Laboratory,National Center for Electron Microscopy

[3] University of California,Department of Materials Science & Engineering

[4] Nanotechnology and Functional Materials Center,undefined

[5] Faculty of Technology and Metallurgy,undefined

[6] University of Belgrade,undefined

来源：

Journal of Materials Science | 2011年 / 46卷

关键词：

Al2O3; Glassy Phase; Triple Line; Silicide Phase; Interfacial Fracture Energy;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Alumina–niobium interfaces formed by liquid-film-assisted joining with copper/niobium/copper interlayers exhibited microstructures that depend on the nature of the alumina components. Characterization of these interfaces in the transmission electron microscope provided insight on the relationship between interfacial microstructure and fracture performance. Interfaces between sapphire and niobium and those between high-purity (99.9%) polycrystalline alumina and niobium were free of secondary phases. However, niobium silicides were found at interfaces between lower-purity (99.5%) alumina and niobium, identified by electron diffraction analysis as the body-centered tetragonal α-Nb5Si3 phase. Spatially resolved compositional analysis was conducted on silicide particles at and away from the interface.

引用

页码：3969 / 3981

页数：12

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