Manufacturing garnet ferrite film resonators using the chemical etching technique

被引：0
|
作者：
S. A. Yur’ev
S. I. Yushchuk
机构：
[1] National University Lviv Polytechnic,
来源：
Instruments and Experimental Techniques | 2013年 / 56卷
关键词：
Ferrite; Ferrite Film; Silicon Adhesive; Garnet Ferrite; Surface Magnetostatic Wave;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
A procedure of manufacturing microwave resonators on the basis of epitaxial Y3Fe5O12 and (Y, Sm, Lu, Ca)3(Fe, Ge)5O12 garnet ferrites with thicknesses of ≤5 μm, which are grown on gallium-gadolinium garnet substrates, is described. To obtain circular garnet ferrites—resonators with diameters of 0.5–3.0 mm-via chemical etching in orthophosphoric acid at T = 60–175°C, protecting SiO2, silicon adhesive, and photoresist coatings are used. It is established that the resonators that were manufactured using a protective FP-383 photoresist coating have the narrowest ferromagnetic-resonance line.
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页码：741 / 744
页数：3
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