Physical Features of the Particle Flow Created by a Low-Power Helicon Plasma Source

被引:0
|
作者
I. I. Zadiriev
K. V. Vavilin
E. A. Kralkina
A. M. Nikonov
G. V. Shvydky
机构
[1] Moscow State University,
来源
Plasma Physics Reports | 2022年 / 48卷
关键词
radio frequency; inductive; helicon plasma source;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:961 / 972
页数:11
相关论文
共 50 条
  • [1] Physical Features of the Particle Flow Created by a Low-Power Helicon Plasma Source
    Zadiriev, I. I.
    Vavilin, K. V.
    Kralkina, E. A.
    Nikonov, A. M.
    Shvydky, G., V
    PLASMA PHYSICS REPORTS, 2022, 48 (09) : 961 - 972
  • [2] Experimental study of the plasma flow created by a low-power helicon source and approaches to increase the average energy of its ion component
    Zadiriev, I. I.
    Kralkina, E. A.
    Shvydkiy, G. V.
    Nikonov, A. M.
    Vavilin, K. V.
    VACUUM, 2024, 226
  • [3] Physical Properties of a Low-Power Helicon Source Operating on a High-Frequency Discharge with a Capacitive Component
    I. I. Zadiriev
    K. V. Vavilin
    E. A. Kral’kina
    A. M. Nikonov
    G. V. Shvydkii
    Plasma Physics Reports, 2023, 49 : 890 - 900
  • [4] Physical Properties of a Low-Power Helicon Source Operating on a High-Frequency Discharge with a Capacitive Component
    Zadiriev, I. I.
    Vavilin, K. V.
    Kral'kina, E. A.
    Nikonov, A. M.
    Shvydkii, G. V.
    PLASMA PHYSICS REPORTS, 2023, 49 (07) : 890 - 900
  • [5] REENTRANT CAVITY AS A LOW-POWER PLASMA SOURCE
    BROWN, MR
    SHERIDAN, TE
    HAYES, MA
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1986, 57 (12): : 2957 - 2960
  • [6] Low-power RF plasma sources for technological applications: III. Helicon plasma sources
    Vavilin, KV
    Rukhadze, AA
    Ri, KM
    Plaksin, VY
    TECHNICAL PHYSICS, 2004, 49 (06) : 691 - 697
  • [7] Low-Power RF plasma sources for technological applications: III. helicon plasma sources
    K. V. Vavilin
    A. A. Rukhadze
    Kh. M. Ri
    V. Yu. Plaksin
    Technical Physics, 2004, 49 : 691 - 697
  • [8] Physical processes in a low-power inductive plasma source in the presence of a weak magnetic field
    Ivandikov F.I.
    Zadiriev I.I.
    Kralkina E.A.
    Applied Physics, 2021, (05): : 38 - 43
  • [9] LOW-POWER MICROWAVE PLASMA SOURCE FOR CHROMATOGRAPHY DETECTION
    JANSEN, GW
    HUF, FA
    DEJONG, HJ
    SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1985, 40 : 307 - 316
  • [10] Plasma Diagnostics of a High Power Helicon Source
    Sun B.
    Zhao Y.
    Wei J.-G.
    Fang J.-H.
    Tan C.
    Tuijin Jishu/Journal of Propulsion Technology, 2019, 40 (03): : 707 - 713