An integrated planning approach for a nanodeposition manufacturing process

被引:0
|
作者
Dong Tang
Udatta S. Palekar
机构
[1] Intel Corporation,
[2] University of Illinois at Urbana-Champaign,undefined
[3] 2130 East Saltsage Drive,undefined
关键词
Process planning; Nanodeposition manufacturing systems; Pattern decomposition; Fluidic routing; Toolbit path planning;
D O I
暂无
中图分类号
学科分类号
摘要
This paper deals with the planning problem in a nanodeposition manufacturing process, in which a toolbit that consists of a multilayer grid of micro/nanofluidic channels is used to deposit nanoscale liquid materials to desired positions on workparts to form solid patterns. The objective is to obtain a planning procedure that achieves efficient throughput for the studied nanodeposition manufacturing systems. We break down the studied problem into several sub-problems as design pattern decomposition, nanopore assignment, liquid material routing in the multilayer grid fluidic network, and toolbit path planning. Efficient algorithms are proposed to solve these sub-problems individually, and then finally integrated into a framework that systematically plans the nanodeposition manufacturing process. A software tool that plans, simulates, and controls the nanodeposition manufacturing process by implementing the proposed algorithms is reported in this paper.
引用
收藏
页码:561 / 573
页数:12
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