Low-temperature, chemical vapor deposition of thin-layer pyrolytic carbon coatings derived from camphor as a green precursor

被引:0
|
作者
Zeinab Sadat Sheikholeslami
Mohammad Yousefi
Mohammad Imani
Morteza Daliri Joupari
机构
[1] Iran Polymer and Petrochemical Institute,Gas Conversion Department, Faculty of Petrochemicals
[2] Iran Polymer and Petrochemical Institute,Novel Drug Delivery Systems Department, Faculty of Science
[3] National Institute of Genetic Engineering and Biotechnology,Animal and Marine Biotechnology Department
来源
关键词
Camphor; Nanoindentation; Fibrinogen Oxidation; Total Energy Load; Amorphous Carbon Formation;
D O I
暂无
中图分类号
学科分类号
摘要
Camphor, C10H16O, as a natural and renewable carbon precursor, can be pyrolyzed to pyrolytic carbon (PyC; pyrocarbon) with significant industrial applications from conducting electrodes to biomedical implant coatings. Here, a simple but controllable chemical vapor deposition setup, operating at low temperatures (650–800 °C) in nitrogen atmosphere at ambient pressure in the absence of catalyst, was used. According to XRD and Raman spectroscopy, nanocrystalline thin PyC films were obtained at this temperature range without a significant change in Lc and d002 values. When the deposition temperature increased from 700 to 800 °C, La and crystallinity percentage values were increased from 2.40 nm and 73.16% to 4.15 nm to 87.58%, respectively. SEM and AFM analyses showed smooth (Ra ≈ 1 nm) and shiny surface for the thin films with 10–500-nm range thickness. The films were hydrophilic on surface (water contact angle ≈ 72.45°) with surface free energy of ≈ 41 mN/m. Young’s modulus, hardness and friction coefficient of the thin PyC coatings were calculated using nanoindentation technique as ≈ 29.9, 3.5 GPa and 0.09, respectively. Resistivity of the films was 2.21 × 10−5 Ωm, so it can be anticipated to repel the blood cells. Cytocompatibility screening in direct contact mode and in vitro biocompatibility findings supported cyto- and hemocompatible properties for the PyC specimens synthesized from camphor.
引用
收藏
页码:959 / 976
页数:17
相关论文
共 50 条
  • [41] CHARACTERIZATION OF CHROMIUM NITRIDE AND CARBONITRIDE COATINGS DEPOSITED AT LOW-TEMPERATURE BY ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION
    SCHUSTER, F
    MAURY, F
    NOWAK, JF
    BERNARD, C
    SURFACE & COATINGS TECHNOLOGY, 1991, 46 (03): : 275 - 288
  • [42] Finding a promising precursor for chemical vapor deposition of carbon nitride thin films
    Uddin, MN
    Notomi, H
    Kida, T
    Yamazato, M
    Nagano, M
    THIN SOLID FILMS, 2004, 464 : 170 - 174
  • [43] LOW-TEMPERATURE DEPOSITION OF HEXAGONAL BN FILMS BY CHEMICAL VAPOR-DEPOSITION
    MOTOJIMA, S
    TAMURA, Y
    SUGIYAMA, K
    THIN SOLID FILMS, 1982, 88 (03) : 269 - 274
  • [44] Low-Temperature Synthesis of Carbon Nanotubes via Floating Catalyst Chemical Vapor Deposition Method
    Rashid, A. Mahmood
    Radiah, A. B. Dayang
    Zurina, Z. A.
    Fakhru'l-Razi, A.
    FULLERENES NANOTUBES AND CARBON NANOSTRUCTURES, 2011, 19 (06) : 522 - 531
  • [45] Specific features of the structure and properties of carbon nanocolumns formed by low-temperature chemical vapor deposition
    D. G. Gromov
    N. I. Borgardt
    R. L. Volkov
    V. A. Galperin
    Ya. S. Grishina
    S. V. Dubkov
    Semiconductors, 2013, 47 : 1703 - 1706
  • [46] Low-temperature single-wall carbon nanotube synthesis by thermal chemical vapor deposition
    Liao, HW
    Hafner, JH
    JOURNAL OF PHYSICAL CHEMISTRY B, 2004, 108 (22): : 6941 - 6943
  • [47] Low-temperature growth of carbon nanofiber by thermal chemical vapor deposition using CuNi catalyst
    Aoki, Katsunori
    Yamamoto, Tetsurou
    Furuta, Hiroshi
    Ikuno, Takashi
    Honda, Shinichi
    Furuta, Mamoru
    Oura, Kenjiro
    Hirao, Takashi
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (6A): : 5329 - 5331
  • [48] Specific features of the structure and properties of carbon nanocolumns formed by low-temperature chemical vapor deposition
    Gromov, D. G.
    Borgardt, N. I.
    Volkov, R. L.
    Galperin, V. A.
    Grishina, Ya S.
    Dubkov, S. V.
    SEMICONDUCTORS, 2013, 47 (13) : 1703 - 1706
  • [49] Low-temperature plasma-enhanced chemical vapor deposition of carbon films and their emission properties
    Vinogradov, AY
    Andronov, AN
    Kosarev, AI
    Abramov, AS
    SEMICONDUCTORS, 2001, 35 (06) : 669 - 673
  • [50] Low-temperature growth of carbon nanofiber by thermal chemical vapor deposition using CuNi catalyst
    Aoki, Katsunori
    Yamamoto, Tetsurou
    Furuta, Hiroshi
    Ikuno, Takashi
    Honda, Shinichi
    Furuta, Mamoru
    Oura, Kenjiro
    Hirao, Takashi
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2006, 45 (6 A): : 5329 - 5331