β-Ga2O3 material properties, growth technologies, and devices: a review

被引:111
|
作者
Higashiwaki, Masataka [1 ]
机构
[1] Natl Inst Informat & Commun Technol, Adv ICT Res Inst, Koganei Frontier Res Ctr, Green ICT Device Lab, 4-2-1 Nukui Kitamachi, Koganei, Tokyo 1848795, Japan
来源
AAPPS BULLETIN | 2022年 / 32卷 / 01期
关键词
Gallium oxide (Ga2O3); SCHOTTKY-BARRIER DIODES; SINGLE-CRYSTALS; MOSFETS; SEMICONDUCTORS; FREQUENCY; MOBILITY; EPITAXY; VOLTAGE; FIGURE; MERIT;
D O I
10.1007/s43673-021-00033-0
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Rapid progress in beta-gallium oxide (beta-Ga2O3) material and device technologies has been made in this decade, and its superior material properties based on the very large bandgap of over 4.5 eV have been attracting much attention. beta-Ga2O3 appears particularly promising for power switching device applications because of its extremely large breakdown electric field and availability of large-diameter, high-quality wafers manufactured from melt-grown bulk single crystals. In this review, after introducing material properties of beta-Ga2O3 that are important for electronic devices, current status of bulk melt growth, epitaxial thin-film growth, and device processing technologies are introduced. Then, state-of-the-art beta-Ga2O3 Schottky barrier diodes and field-effect transistors are discussed, mainly focusing on development results of the author's group.
引用
收藏
页数:14
相关论文
共 50 条
  • [21] Effects of preparation parameters on growth and properties of β-Ga2O3 film
    Chen, Zi-Hao
    Wang, Yong-Sheng
    Zhang, Ning
    Zhou, Bin
    Gao, Jie
    Wu, Yan-Xia
    Ma, Yong
    Hei, Hong-Jun
    Shen, Yan-Yan
    He, Zhi-Yong
    Yu, Sheng-Wang
    CHINESE PHYSICS B, 2023, 32 (01)
  • [22] Current status of Ga2O3 power devices
    Higashiwaki, Masataka
    Murakami, Hisashi
    Kumagai, Yoshinao
    Kuramata, Akito
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2016, 55 (12)
  • [23] Effects of preparation parameters on growth and properties of β-Ga2O3 film
    陈子豪
    王永胜
    张宁
    周兵
    高洁
    吴艳霞
    马永
    黑鸿君
    申艳艳
    贺志勇
    于盛旺
    Chinese Physics B, 2023, 32 (01) : 504 - 511
  • [24] Nano-structured phases of gallium oxide (GaOOH, α-Ga2O3, β-Ga2O3, γ-Ga2O3, δ-Ga2O3, and ε-Ga2O3): fabrication, structural, and electronic structure investigations
    Sharma, Aditya
    Varshney, Mayora
    Saraswat, Himani
    Chaudhary, Surekha
    Parkash, Jai
    Shin, Hyun-Joon
    Chae, Keun-Hwa
    Won, Sung-Ok
    INTERNATIONAL NANO LETTERS, 2020, 10 (01) : 71 - 79
  • [25] Nano-structured phases of gallium oxide (GaOOH, α-Ga2O3, β-Ga2O3, γ-Ga2O3, δ-Ga2O3, and ε-Ga2O3): fabrication, structural, and electronic structure investigations
    Aditya Sharma
    Mayora Varshney
    Himani Saraswat
    Surekha Chaudhary
    Jai Parkash
    Hyun-Joon Shin
    Keun-Hwa Chae
    Sung-Ok Won
    International Nano Letters, 2020, 10 : 71 - 79
  • [26] Band offset and electrical properties of ErZO/ β-Ga2O3 and GZO/ β-Ga2O3 heterojunctions
    Shi, Ying-Li
    Huang, Dong
    Ling, Francis Chi-Chung
    APPLIED SURFACE SCIENCE, 2022, 576
  • [27] Contact barriers modulation of graphene/β-Ga2O3 interface for high-performance Ga2O3 devices
    Yuan, Haidong
    Su, Jie
    Guo, Rui
    Tian, Ke
    Lin, Zhenhua
    Zhang, Jincheng
    Chang, Jingjing
    Hao, Yue
    APPLIED SURFACE SCIENCE, 2020, 527
  • [28] Bulk Crystal Growth of Ga2O3
    Kuramata, Akito
    Koshi, Kimiyoshi
    Watanabe, Shinya
    Yamaoka, Yu
    Masui, Takekazu
    Yamakoshi, Shigenobu
    OXIDE-BASED MATERIALS AND DEVICES IX, 2018, 10533
  • [29] Growth and stability of Ga2O3 nanospheres
    Penner, Simon
    Kloetzer, Bernhard
    Jenewein, Bernd
    Klauser, Frederik
    Liu, Xianjie
    Bertel, Erminald
    THIN SOLID FILMS, 2008, 516 (15) : 4742 - 4749
  • [30] Growth and microstructure of Ga2O3 nanorods
    Han, WQ
    Kohler-Redlich, P
    Ernst, F
    Rühle, M
    SOLID STATE COMMUNICATIONS, 2000, 115 (10) : 527 - 529