On the Optical Properties and Structure of In2O3 Films Deposited onto Al2O3 (012) Substrates by dc-Magnetron Sputtering

被引：0
|
作者：
A. A. Tikhii
Yu. M. Nikolaenko
K. A. Svyrydova
I. V. Zhikharev
机构：
[1] Lugansk State Pedagogical University,
[2] Galkin Donetsk Institute for Physics and Engineering,undefined
[3] Donbas National Academy of Civil Engineering and Architecture,undefined
来源：
Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques | 2023年 / 17卷
关键词：
indium oxide; films; sapphire; ellipsometry; optical transmission; X-ray diffraction analysis; magnetron deposition; annealing; substrate temperature; deposition time; band gap; optical properties;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：562 / 567
页数：5
相关论文
共 50 条
  • [1] On the Optical Properties and Structure of In2O3 Films Deposited onto Al2O3 (012) Substrates by dc-Magnetron Sputtering
    Tikhii, A. A.
    Nikolaenko, Yu. M.
    Svyrydova, K. A.
    Zhikharev, I. V.
    JOURNAL OF SURFACE INVESTIGATION, 2023, 17 (03): : 562 - 567
  • [2] Properties of In2O3 Films, Deposited by dc-Magnetron Sputtering on Al2O3 Substrates with Different Temperatures
    Gritskikh, Vladimir A.
    Zhikharev, Igor V.
    Kara-Murza, Svetlana V.
    Korchikova, Nataliya V.
    Krasnyakova, Tatyana V.
    Nikolaenko, Yuri M.
    Tikhii, Alexandr A.
    Pavlenko, Anatoly V.
    Yurasov, Yuriy I.
    ADVANCED MATERIALS: TECHNIQUES, PHYSICS, MECHANICS AND APPLICATIONS, 2017, 193 : 55 - 63
  • [3] PREPARATION AND PROPERTIES OF AL2O3 FILMS BY DC AND RF MAGNETRON SPUTTERING
    DESHPANDEY, C
    HOLLAND, L
    THIN SOLID FILMS, 1982, 96 (03) : 265 - 270
  • [4] Structure and some physical properties of In2O3 films deposited on In2O3 substrates
    Muranaka, Shigetoshi
    Shigematsu, Toshihiko
    Funtai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy, 1998, 45 (01): : 93 - 97
  • [5] Optical Properties of a-Al2O3 Films Deposited by MF Magnetron Sputtering
    Yan Shao-feng
    Luo Hong
    VACUUM TECHNOLOGY AND SURFACE ENGINEERING - PROCEEDINGS OF THE 9TH VACUUM METALLURGY AND SURFACE ENGINEERING CONFERENCE, 2009, : 344 - +
  • [6] DC-magnetron sputtering of ZnO:Al films on (00.1)Al2O3 substrates from slip-casting sintered ceramic targets
    Miccoli, I.
    Spampinato, R.
    Marzo, F.
    Prete, P.
    Lovergine, N.
    APPLIED SURFACE SCIENCE, 2014, 313 : 418 - 423
  • [7] Al2O3 films deposited by plasma source enhanced magnetron sputtering
    Lei, MK
    Yuan, LJ
    Zhang, ZL
    JOURNAL OF INORGANIC MATERIALS, 2002, 17 (04) : 887 - 890
  • [8] Properties of Ti-doped Al2O3 thin films deposited by simultaneous RF and DC magnetron sputtering
    Lin, Su-Shia
    Gao, Yu-Lun
    Hu, Shao-Yin
    Fan, Sheng-You
    Tsai, Yung-Shiang
    VACUUM, 2014, 107 : 225 - 230
  • [9] The thermoelectric properties of In2O3 thin films deposited by direct current magnetron sputtering
    Ye, Fan
    Su, Xiao-Qiang
    Cai, Xing-Min
    Wang, Huan
    Zheng, Zhuang-Hao
    Liang, Guang-Xing
    Fan, Ping
    Zhang, Dong-Ping
    Luo, Jing-Ting
    PROCEEDINGS OF THE 3RD INTERNATIONAL CONFERENCE ON MATERIAL, MECHANICAL AND MANUFACTURING ENGINEERING, 2015, 27 : 1917 - 1922
  • [10] Effects of gas parameters on properties of In2O3 thin films deposited by magnetron sputtering
    Cai, Xi-Kun
    Yuan, Zi-Jian
    Zhu, Xia-Ming
    Zhang, Bing-Po
    Qiu, Dong-Jiang
    Wu, Hui-Zhen
    Rengong Jingti Xuebao/Journal of Synthetic Crystals, 2011, 40 (01): : 17 - 21
12345