Dependence of the contact line roughness exponent on the contact angle on substrates with dilute mesa defects: numerical study

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作者：
Stanimir Iliev
Nina Pesheva
Pavel Iliev
机构：
[1] Institute of Mechanics,
[2] Bulgarian Academy of Sciences,undefined
[3] ETH Zurich,undefined
[4] Computational Physics for Engineering Materials,undefined
来源：
The European Physical Journal E | 2022年 / 45卷
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