Control tribological and mechanical properties of MEMS surfaces. Part 2: nanomechanical behavior of self-lubricating ultrathin films

被引：0
|
作者：
Z. Rymuza
M. Misiak
L. Kuhn
K. Schmidt-Szałowski
Z. Rżanek-Boroch
机构：
[1] Warsaw University of Technology,
[2] Institute of Micromechanics and Photonics,undefined
[3] Chodkiewicza 8,undefined
[4] 02-525 Warszawa,undefined
[5] Poland,undefined
[6] Hysitron Inc.,undefined
[7] 5251 West 73rd Street,undefined
[8] Minneapolis,undefined
[9] MN 55439,undefined
[10] USA,undefined
[11] Warsaw University of Technology,undefined
[12] Faculty of Chemistry,undefined
[13] Noakowskiego 3,undefined
[14] 00-664 Warszawa,undefined
[15] Poland,undefined
来源：
Microsystem Technologies | 1999年 / 5卷
关键词：
Silicon; Mechanical Property; Dioxide; Nitride; Silicon Wafer;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
 Results of nanomechanical studies of ultrathin silicon dioxide and silicon nitride films are discussed. Films applicable to MEMS technology were manufactured on single-crystal silicon wafer’s at atmospheric perssure by the glow discharge technique.
引用
收藏
页码：181 / 188
页数：7
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