A Study on the Effect of 50 keV Nitrogen Ion Implantation in Mg2Si Thin Films

被引：0
|
作者：
Suniksha Gupta
Smita Howlader
Satyavir Singh
Atul Sharma
K. Asokan
M. K. Banerjee
K. Sachdev
机构：
[1] Malaviya National Institute of Technology,Department of Physics
[2] Malaviya National Institute of Technology,Materials Research Centre
[3] Inter-University Accelerator Centre,Material Science Division
[4] Suresh Gyan Vihar University,Research Chair
来源：
Silicon | 2023年 / 15卷
关键词：
Thermoelectric thin films-Mg2Si-ion; Implantation-sputtering-Nitrogen ion;
D O I：
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中图分类号：
学科分类号：
摘要：
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页码：6521 / 6532
页数：11
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