Compensating for bias

被引：0
|
作者：
Mark Blamire
Bryan Hickey
机构：
[1] Cambridge University,Department of Material Science
[2] E. C. Stoner Laboratory,Department of Physics and Astronomy
[3] University of Leeds,undefined
来源：
Nature Materials | 2006年 / 5卷
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D O I：
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学科分类号：
摘要：
The atomic-scale roughness of ferromagnetic and antiferromagnetic layers is crucial to their magnetic coupling, with important consequences for practical magnetic devices.
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页码：87 / 88
页数：1
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