Oxide;
SiO2;
Free Path;
Strong Electric Field;
Effective Electron;
D O I:
10.1023/A:1016343315052
中图分类号:
学科分类号:
摘要:
Ge-doped SiO2 films on Si are examined by methods of photoinjection and capacitance-voltage characteristics. It is demonstrated that the effective electron free path is decreased in Ge-doped oxides. The doping is also shown to increase the breakdown field of the oxide by 10-15%. It is concluded that Ge doping reduces the degradation of SiO2 in strong electric fields.