Microelectrode patterning of metal films using pulsed UV-laser system

被引：0
|
作者：
Chih-Chung Yang
Wen-Tse Hsiao
Chien-Kai Chung
Hsin-Yi Tsai
Jer-Liang Andrew Yeh
Kuo-Cheng Huang
机构：
[1] Instrument Technology Research Center,Institute of Nanoengineering and Microsystems
[2] National Applied Research Laboratories,Department of Power Mechanical Engineering
[3] National Tsing Hua University,undefined
[4] National Tsing Hua University,undefined
来源：
Applied Physics A | 2014年 / 117卷
关键词：
Graphene Oxide; Scanning Speed; Metal Film; Laser Fluence; Electrical Isolation;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
This study presents a maskless method to conduct microelectrode patterning of metal films using pulsed UV-laser-writing technology. The experimental procedures involved designing the ablation region of a glass substrate, ablation path planning, and determining detailed laser-writing parameters. The various parameters used in a UV-laser-writing system were investigated and analyzed using an optical microscope and a three-dimensional confocal laser scanning microscope. This technique was successfully applied in patterning aluminum (Al) thin film on a glass substrate for use in microheater devices. The measurements of electrical resistance and temperature distribution on the substrate demonstrated that no short circuiting occurred in the microheater, confirming the quality of the electrical isolation values.
引用
收藏
页码：161 / 168
页数：7
相关论文
共 50 条
  • [31] Pulsed Laser Interference Patterning of Metallic Thin Films
    Riedel, S.
    Leiderer, P.
    Scheer, E.
    Boneberg, J.
    ACTA PHYSICA POLONICA A, 2012, 121 (02) : 385 - 387
  • [32] Direct patterning of microelectrode arrays using femtosecond laser micromachining
    Hayden, C. J.
    Dalton, C.
    APPLIED SURFACE SCIENCE, 2010, 256 (12) : 3761 - 3766
  • [33] HETEROEPITAXIAL SI SI1-XGEX SI STRUCTURES PRODUCED USING PULSED UV-LASER PROCESSING
    KRAMER, KJ
    TALWAR, S
    SIGMON, TW
    WEINER, KH
    APPLIED PHYSICS LETTERS, 1994, 65 (13) : 1709 - 1711
  • [34] MECHANISMS OF PULSED UV LASER IONIZATION OF MOLECULES ADSORBED TO THIN METAL-FILMS
    MILLARD, JR
    YANG, M
    REILLY, JP
    JOURNAL OF PHYSICAL CHEMISTRY, 1987, 91 (16): : 4323 - 4329
  • [35] Optical SHG for ZnO films with different morphology stimulated by UV-laser thermotreatment
    Ebothe, J.
    Miedzinski, R.
    Kapustianyk, V.
    Turko, B.
    Kulyk, B.
    Gruhn, W.
    Kityk, I. V.
    XIII INTERNATIONAL SEMINAR ON PHYSICS AND CHEMISTRY OF SOLIDS, 2007, 79
  • [36] Optical and Acoustical Process Control in Hybrid Micromachining Using a Picosecond Pulsed UV-laser and Micro EDM-milling
    Schulze, V.
    Weber, P.
    Ruhs, C.
    PROCEEDINGS OF THE 8TH INTERNATIONAL CONFERENCE ON MULTI-MATERIAL MICRO MANUFACTURE (4M 2011), 2011, : 83 - 86
  • [37] Laboratory studies of metal atomic beams produced by means of UV-laser radiation
    Mattoo, SK
    Wirtz, L
    Pospieszczyk, A
    Schweer, B
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1997, 124 (04): : 579 - 590
  • [38] Electrode patterning and annealing processes of aluminum-doped zinc oxide thin films using a UV laser system
    Hsiao, Wen-Tse
    Tseng, Shih-Feng
    Huang, Kuo-Cheng
    Chiang, Donyau
    OPTICS AND LASERS IN ENGINEERING, 2013, 51 (01) : 15 - 22
  • [39] Patterning of nanoparticulate transparent conductive ITO films using UV light irradiation and UV laser beam writing
    Solieman, A.
    Moharram, A. H.
    Aegerter, M. A.
    APPLIED SURFACE SCIENCE, 2010, 256 (06) : 1925 - 1929
  • [40] Direct patterning of double-layered metal thin films by a pulsed Nd:YAG laser beam
    Yoo, Hyeonggeun
    Shin, Hyunkwon
    Lee, Myeongkyu
    THIN SOLID FILMS, 2010, 518 (10) : 2775 - 2778
12345