Microelectrode patterning of metal films using pulsed UV-laser system

被引：0
|
作者：
Chih-Chung Yang
Wen-Tse Hsiao
Chien-Kai Chung
Hsin-Yi Tsai
Jer-Liang Andrew Yeh
Kuo-Cheng Huang
机构：
[1] Instrument Technology Research Center,Institute of Nanoengineering and Microsystems
[2] National Applied Research Laboratories,Department of Power Mechanical Engineering
[3] National Tsing Hua University,undefined
[4] National Tsing Hua University,undefined
来源：
Applied Physics A | 2014年 / 117卷
关键词：
Graphene Oxide; Scanning Speed; Metal Film; Laser Fluence; Electrical Isolation;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
This study presents a maskless method to conduct microelectrode patterning of metal films using pulsed UV-laser-writing technology. The experimental procedures involved designing the ablation region of a glass substrate, ablation path planning, and determining detailed laser-writing parameters. The various parameters used in a UV-laser-writing system were investigated and analyzed using an optical microscope and a three-dimensional confocal laser scanning microscope. This technique was successfully applied in patterning aluminum (Al) thin film on a glass substrate for use in microheater devices. The measurements of electrical resistance and temperature distribution on the substrate demonstrated that no short circuiting occurred in the microheater, confirming the quality of the electrical isolation values.
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收藏
页码：161 / 168
页数：7
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