All-dielectric metasurface for high-performance structural color

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作者
Wenhong Yang
Shumin Xiao
Qinghai Song
Yilin Liu
Yunkai Wu
Shuai Wang
Jie Yu
Jiecai Han
Din-Ping Tsai
机构
[1] Harbin Institute of Technology,Ministry of Industry and Information Technology Key Lab of Micro
[2] Shenzhen,Nano Optoelectronic Information System
[3] Shanxi University,Collaborative Innovation Center of Extreme Optics
[4] Harbin Institute of Technology,National Key Laboratory of Science and Technology on Advanced Composites in Special Environments
[5] The Hong Kong Polytechnic University,Department of Electronic and Information Engineering
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摘要
The achievement of structural color has shown advantages in large-gamut, high-saturation, high-brightness, and high-resolution. While a large number of plasmonic/dielectric nanostructures have been developed for structural color, the previous approaches fail to match all the above criterion simultaneously. Herein we utilize the Si metasurface to demonstrate an all-in-one solution for structural color. Due to the intrinsic material loss, the conventional Si metasurfaces only have a broadband reflection and a small gamut of 78% of sRGB. Once they are combined with a refractive index matching layer, the reflection bandwidth and the background reflection are both reduced, improving the brightness and the color purity significantly. Consequently, the experimentally demonstrated gamut has been increased to around 181.8% of sRGB, 135.6% of Adobe RGB, and 97.2% of Rec.2020. Meanwhile, high refractive index of silicon preserves the distinct color in a pixel with 2 × 2 array of nanodisks, giving a diffraction-limit resolution.
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