Selective tungsten deposition into ordered nanohole arrays of anodic porous alumina by electron-beam-induced deposition

被引：0
|
作者：
G.Q. Xie
M. Song
K. Mitsuishi
K. Furuya
机构：
[1] National Institute for Materials Science,Nanomaterials Laboratory
来源：
Applied Physics A | 2004年 / 79卷
关键词：
Alumina; Spectroscopy; Microscopy; Electron Microscopy; Tungsten;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
The selective deposition of a metal (tungsten) into ordered nanohole arrays of an anodic porous alumina membrane was performed using an electron-beam-induced deposition process. After deposition, the membrane was observed and analyzed using electron microscopy and energy-dispersive X-ray spectroscopy. It is shown that the deposition was preferentially conducted in the holes in the irradiated area of the electron beam. A calculation of the electron-beam intensity explains the reason for the preferential deposition in the holes.
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页码：1843 / 1846
页数：3
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